Temperature-controlled semiconductor wafer chuck system
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United States of America Patent
Stats
-
Jun 24, 2003
Grant Date -
Feb 14, 2002
app pub date -
Jan 26, 1999
filing date -
Jan 26, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A temperature-controlled semiconductor wafer chuck system, the chuck being configured for mounting on a prober stage of a wafer probe test station, the chuck having a top surface and a bottom surface and including a heat sink configured for removing thermal energy from the chuck, a primary heater configured to add heat to the chuck adjacent the top surface of the chuck and a secondary heater adjacent the bottom of the chuck, whereby the temperature of the top surface of the chuck and the bottom of the chuck can be independently controlled; and wherein the chuck can include a plurality of layers above the heat sink which are connected so as to accommodate differential expansion and contraction and thereby minimize distortion of the chuck due to thermal effects; and wherein the heat sink and associated layers integrally connected are configured to stiffen the chuck and resist deformation due to forces applied to the chuck by probe pins.
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