Illuminating system of a microlithographic projection exposure arrangement
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United States of America Patent
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Jun 24, 2003
Issued Date -
N/A
app pub date -
Jun 4, 2001
filing date -
Nov 30, 1998
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Abstract
The invention relates to an illuminating system of a microlithographic projection exposure arrangement having a light source (1), a first objective (7), a fly-eye-integrator (11), a diaphragm plane (13), a condenser optic (15), and an image plane (21) having a field to be illuminated. The fly-eye-integrator (11) includes at least a first one-dimensional array (39) of first cylinder lenses having first cylinder axes and a second one-dimensional array (47) of second cylinder lenses having second cylinder axes. The second cylinder axes are aligned perpendicularly to the first cylinder axes. A third one-dimensional array (35) of third cylinder lenses having third cylinder axes are mounted forward of the first array (39) to increase divergence. The third cylinder axes are aligned parallelly to the first cylinder axes and a fourth one-dimensional array (43) of fourth cylinder lenses having fourth cylinder axes is arranged forward of the second array (47) for increasing divergence. The fourth cylinder axes are aligned parallel to the second cylinder axes.
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