Structure and method for fabricating an electro-rheological lens
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United States of America Patent
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Jul 1, 2003
Grant Date -
Jan 30, 2003
app pub date -
Jul 25, 2001
filing date -
Jul 25, 2001
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Abstract
High quality epitaxial layers of monocrystalline materials can be grown layered monocrystallinfe substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. Formation of a compliant substrate may include utilizing surfactant-enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials. The layered monocrystalline substrates allow for the fabrication of at least one optical device with an insulating material laid over it, wherein the insulating material provides an optical aperture for use with the optical device. A conductive material can be deposited within the insulating material, and an electro-rheological lens can be inserted within the insulating material aperture, while being in contact with the conductive material.
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