Method for treating surfaces of substrates and apparatus
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United States of America Patent
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-
Jul 8, 2003
Grant Date -
Aug 22, 2002
app pub date -
Apr 26, 2002
filing date -
Nov 26, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The apparatus has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.
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