Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film
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United States of America Patent
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Jul 8, 2003
Issued Date -
N/A
app pub date -
Apr 26, 2001
filing date -
Dec 15, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.
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