Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process
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United States of America Patent
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Jul 22, 2003
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app pub date -
Nov 16, 2001
filing date -
Nov 16, 2001
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Abstract
The present invention provides a process for producing particles suitable for use as abrasives in chemical-mechanical polishing slurries. The process according to the invention includes adding a crystallization promoter such as Ti[OCH(CH.sub.3).sub.2)].sub.4 to an aqueous cerium salt solution, adjusting the pH of the solution to higher than 7.0 using one or more bases, and subjecting the solution to hydrothermal treatment at a temperature of from about 90.degree. C. to about 500.degree. C. to produce the particles.
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