Temperature controlled chamber
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Jul 29, 2003
Grant Date -
N/A
app pub date -
Mar 24, 2000
filing date -
Mar 24, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A substrate processing chamber 25 comprising a substrate support 85, and a wall 24 about the substrate support 85, the wall 24 having a radiation absorbing surface 36 adapted to preferentially absorb radiation having wavelengths in the visible or infra-red spectrum.
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