Gas delivery system
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United States of America Patent
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-
Aug 5, 2003
Grant Date -
N/A
app pub date -
Dec 18, 2000
filing date -
Mar 4, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A substrate is treated by supplying an etchant and/or deposition gas into a chamber in which the substrate is situated. In order to avoid the problems associated with transportation of toxic gases, the gases required for such processes are delivered directly from a gas generation and delivery system positioned locally to the chamber.
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