Manufacture of integrated fluidic devices
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United States of America Patent
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-
Aug 5, 2003
Grant Date -
Oct 31, 2002
app pub date -
Apr 27, 2001
filing date -
Apr 27, 2001
priority date (Note) -
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status (Latency Note)
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Abstract
In a method of fabricating a microstructure for microfluidics applications, a first layer of etchable material is formed on a suitable substrate. A mechanically stable support layer is formed over the etchable material. A mask is applied over the support to expose at least one opening in the mask. An anistropic etch is then performed through the opening to create a bore extending through the support layer to said layer of etchable material. After performing an isotropic etch through the bore to form a microchannel in the etchable material extending under the support layer, a further layer is deposited over the support layer until overhanging portions meet and thereby close the microchannel formed under the opening.
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