Chemical vapor deposition for smooth metal films

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United States of America Patent

PATENT NO 6602796
APP PUB NO 20020048940A1
SERIAL NO

09146303

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Abstract

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A method for growing smooth metal films using a first process phase favorable to nucleation, agglomeration and initiation of smooth metal film growth and a second process phase favorable to continued smooth metal film growth, a system for performing the method, and semiconductor devices so produced.

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Patent Owner(s)

Patent OwnerAddress
MICRON TECHNOLOGY INC8000 SOUTH FEDERAL WAY BOISE ID 83716-9632

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Derderian, Garo J Boise, ID 185 9730
Sandhu, Gurtej Singh Boise, ID 103 4090

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