Method for determination of the radiation stability of crystals

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United States of America Patent

PATENT NO 6603547
APP PUB NO 20020105643A1
SERIAL NO

09975173

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Abstract

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The method for determining radiation stability of a crystal to radiation of a working wavelength to be employed in a subsequent application includes taking a first absorption spectrum (A) of a cleaved piece of the crystal with a given thickness (D) over a predetermined wavelength range from a first wavelength (.lambda..sub.1) to a second wavelength (.lambda..sub.2) by means of a spectrophotometer. Then the cleaved piece of the crystal is irradiated with an energetic radiation source so as to form all theoretically possible color centers (saturation). After the irradiating a second absorption spectrum (B) of the cleaved piece of crystal is taken over the same predetermined wavelength range. Then a surface integral of a difference spectrum of the first absorption spectrum and the second absorption spectrum over the predetermined wavelength range is formed and divided by the thickness (D) to obtain a scaled surface integral value. The absorption coefficient .DELTA.k at the working wavelength for the subsequent application is then obtained preferably from the scaled surface integral value for the damage induced by the energetic radiation and a calibration curve relating the absorption coefficient at the working wavelength to the surface integral of the absorption coefficient induced by the energetic radiation.

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Patent Owner(s)

Patent OwnerAddress
HELLMA MATERIALS GMBH & CO KG07745 JENA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kandler, Joerg Jena, DE 7 34
Moersen, Ewald Mainz, DE 6 39
Speit, Burkhard Jena, DE 31 464
Strenge, Lorenz Ingelheim, DE 2 21

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