Layer thickness control for stereolithography utilizing variable liquid elevation and laser focal length
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United States of America Patent
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Aug 19, 2003
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N/A
app pub date -
Aug 29, 2000
filing date -
Aug 29, 2000
priority date (Note) -
Expired
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Abstract
An apparatus and method for controlling the surface level of a liquid residing within a relatively vertically stationary workpiece support platform disposed within a reservoir for use in stereolithographic processes wherein a layered object or structure is formed by selectively curing portions of the liquid to at least a semisolid state in multiple, at least partially superimposed layers. Providing precise control of liquid depth over the vertically stationary platform as well as focusing of a laser beam for curing the liquid at the varying surface levels thereof relative to the vertically stationary platform is effected using a laser range finder system controlled by a computer used to control the stereolithographic process in a closed loop fashion.
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