Silicon on insulator optical membrane structure for fabry-perot MOEMS filter
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United States of America Patent
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Aug 19, 2003
Grant Date -
Feb 14, 2002
app pub date -
Dec 11, 2000
filing date -
Mar 3, 2000
priority date (Note) -
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Abstract
A process for fabricating an optical membrane device comprises providing a handle wafer and then oxidizing a surface of the handle wafer to form an insulating layer. A device wafer is then bonded to the handle wafer. An optical membrane structure is formed in this device wafer. The insulating layer is selectively removed to release the membrane structure. This device wafer can be manufactured from silicon wafer material. Such material typically has a low number of dislocations yielding a stable mechanical membrane structure. The insulating layer defines the electrical cavity across which electrical fields are established that are used to electrostatically deflect the membrane structure. The insulating layer is between 3 and 6 micrometers (.mu.m) in thickness.
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