Wafer chuck system
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United States of America Patent
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-
Aug 26, 2003
Grant Date -
Sep 26, 2002
app pub date -
Mar 22, 2001
filing date -
Mar 22, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A chuck system applicable to semiconductor fabrication processes for holding a workpiece that includes a pedestal that has an upper surface for supporting a semiconductor wafer, a plurality of gas holes and grooves. The gas holes pass through the pedestal and provide channels for gas to reach the semiconductor wafer. The grooves are formed on the upper surface of the pedestal and connect between the gas holes.
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