Supercritical fluid delivery and recovery system for semiconductor wafer processing
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United States of America Patent
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-
Sep 2, 2003
Grant Date -
Dec 13, 2001
app pub date -
Apr 18, 2001
filing date -
Apr 18, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.
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