Method for making small pore for use in programmable resistance memory element

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Sep 2, 2003
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Sep 19, 2001
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Aug 2, 2001

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Abstract

A method for making a small pore. The defined pore is useful for the fabrication of programmable resistance memory elements. The programmable resistance memory material may be a chalcogenide.

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Patent Owner	Address
OVONYX MEMORY TECHNOLOGY LLC	1940 DUKE STREET SUITE 200 ALEXANDRIA VA 22314

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Klersy, Patrick	Lake Orion, MI	28	3717
Maimon, Jon	Manassas, VA	17	1346

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Method for making small pore for use in programmable resistance memory element

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09955408

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US Family Size	Non-US Coverage
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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
September 02, 2003	US,6613604,B2 US6613604B2	GRANTED PATENT AS SECOND PUBLICATION
February 06, 2003	US,20030027398,A1 US20030027398A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	6613604
SERIAL NO	09955408
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09955408

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