Method for inspecting a reticle
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United States of America Patent
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Sep 2, 2003
Grant Date -
N/A
app pub date -
Dec 18, 1997
filing date -
Dec 18, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Disclosed is a method of inspecting a reticle for defects that occur over time. The invention accomplishes this by generating and storing a 'baseline' image of the reticle and then periodically generating a 'current' image of the reticle and comparing the current and baseline images. The baseline image is taken at a time when the reticle is known to be acceptable. This may be when the reticle has been 'qualified' by an optical test or when a die fabricated by reticle has passed an electrical test. Also disclosed in a method for compacting the baseline image before storage.
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