Method for preparing optical waveguide substrate
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United States of America Patent
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Sep 9, 2003
Grant Date -
N/A
app pub date -
Jul 6, 2000
filing date -
Jul 7, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An optical waveguide substrate is prepared by forming grooves in a silicon substrate in accordance with the pattern of a desired waveguide device, thermally oxidizing the silicon substrate to form a peripheral quartz layer surrounding the grooves, burying in the grooves a doped quartz glass layer having a higher refractive index, abrading the surface of the resulting structure to be flat, and forming on the flat surface a glass layer having a lower refractive index. An optical waveguide substrate featuring no distortion of the core pattern, little warp, and a low loss can be produced in a simple manner.
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