Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
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United States of America Patent
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Sep 9, 2003
Grant Date -
Mar 6, 2003
app pub date -
Sep 6, 2001
filing date -
Sep 6, 2001
priority date (Note) -
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Abstract
A method and system are provided for controlling and/or monitoring a semiconductor processing apparatus while predicting its processing results. The system includes a sensor for monitoring a processing state of the processing apparatus, a sensed data storage unit for preserving sensed data sent from the sensor, an input device for inputting measured values for processing results of semiconductor devices processed by the processing apparatus, a processing result measured value storage unit for preserving the inputted processing result measured values, a model equation generation unit for generating a model equation from preserved sensed data and processing result measured values, a model equation storage unit for preserving the generated model equation, a model equation based prediction unit for predicting processing results from the preserved model equation and the sensed data, and a process recipe control unit for controlling processing conditions of the processing apparatus from predicted processing results.
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