Low stress relaxation elastomeric materials
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United States of America Patent
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Sep 9, 2003
Grant Date -
Aug 29, 2002
app pub date -
Feb 20, 2002
filing date -
Sep 17, 1999
priority date (Note) -
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Abstract
A low stress relaxation elastomeric material comprises a block copolymer having an elasotmeric soft block portion and thermoplastic hard block portions, at least one vinylarene resin and mineral oil. The elasotmeric material may be used in a film comprising an elastomeric layer and at least one substantially less elastomeric skin layer. The skin layer comprises a thermoplastic polymer such as polyolefins. The film exhibits desired elastic and stress relaxation properties at body temperature. The film is useful in forming a macroscopically-expanded, three-dimensional elastomeric web.
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