Integration of ferromagnetic films with ultrathin insulating film using atomic layer deposition

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United States of America Patent

PATENT NO 6617173
SERIAL NO

09974076

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Abstract

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A technique to form an ultrathin dielectric layer over a ferromagnetic layer by atomic layer deposition.

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AIXTRON INC1139 KARLSTAD DRIVE SUNNYVALE CA 94089

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Inventor Name Address # of filed Patents Total Citations
Sneh, Ofer Broomfield, CO 49 7278

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