Liquid coating apparatus with temperature controlling manifold
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United States of America Patent
Stats
-
Sep 16, 2003
Grant Date -
Jan 31, 2002
app pub date -
Jun 29, 2001
filing date -
Jul 3, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for processing a substrate of the present invention comprises a holder holding a substrate, a supply pipe being supplied with a processing solution from a first end and supplying the processing solution to the substrate from a second end, a first temperature controller having a first temperature controlled water circulated inside which controls a first temperature around the second end of the supply pipe and a second temperature controller having a second temperature controlled water drained from the first temperature controller circulated inside, which controls a second temperature around the first end of the supply pipe. With such a configuration, the temperature controlled water used for controlling the temperature of the processing solution just before its application onto the substrate can be recycled for controlling the temperature of the processing solution just after being supplied to a supply pipe.
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