Reflection-reducing film

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United States of America Patent

PATENT NO 6620493
APP PUB NO 20010031317A1
SERIAL NO

09798933

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A reflection-reducing film formed by being applied onto the surface of a substrate having light transmitting property, and including a base layer formed on the surface of said substrate and a surface layer formed on the upper side of said base layer, wherein: said base layer has a thickness of from 50 to 200 nm; and said surface layer is formed of a hydrolyzed product of a silane compound represented by the following formula (I), R.sub.n --Si(X).sub.4-n (I) wherein R is a substituted or unsubstituted alkyl group or an alkenyl group, X is a hydrolyzable group, and n is a number of 1 or 2, a metal chelate compound and a silica sol, and has a thickness of from 50 to 200 nm. The reflection-reducing film is easily formed on a light-transmitting substrate by applying a multi-layer coating thereon, and exhibits an excellent liquid resistance.

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Patent Owner(s)

Patent OwnerAddress
FUKUVI CHEMICAL INDUSTRY CO LTDFUKUI-SHI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hasegawa, Hiroaki Fukui, JP 72 513
Hasimoto, Hirokazu Fukui, JP 1 15
Saitou, Masahiro Fukui, JP 13 121
Tajima, Munetake Fukui, JP 3 28

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