Method for phosphor coating on flat display using electrophoretic deposition and photolithography
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United States of America Patent
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Sep 30, 2003
Grant Date -
N/A
app pub date -
Oct 25, 2000
filing date -
Aug 17, 2000
priority date (Note) -
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Abstract
A method for coating a phosphor on a flat display using electrophoretic deposition (EPD) and lithography is provided. In the method, an adhesive strength can be enhanced without passing through a high-temperature thermal treatment process as a post-process. Phosphor powders are coated on a substrate by a field emission display (FED) and then a ultraviolet (UV) curable layer is coated. Then, an adhesive strength of the phosphor can be greatly enhanced through UV irradiation, in comparison with a post-process such as a thermal treatment process. Also, the UV curable layer can be lithographically etched by the UV light, and thus the phosphor can be coated by a predetermined pattern, to then be applied to a next-generation display such as a FED or PDP as an optimal method for full color realization.
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