Plasma enhanced chemical deposition with low vapor pressure compounds
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United States of America Patent
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Sep 30, 2003
Grant Date -
Sep 6, 2001
app pub date -
May 11, 2001
filing date -
Sep 29, 1997
priority date (Note) -
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Abstract
A method for plasma enhanced chemical vapor deposition of low vapor pressure monomeric materials. The method includes making an evaporate by receiving a plurality of monomeric particles of the low vapor pressure monomeric materials as a spray into a flash evaporation housing, evaporating the spray on an evaporation surface, and discharging the evaporate through an evaporation outlet; making a monomer plasma from the evaporate by passing the evaporate proximate a glow discharge electrode; and cryocondensing the monomer plasma onto the substrate as a cryocondensed monomer. The invention also involves a method for making self-curing polymer layers in a vacuum chamber.
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