Article for use in a semiconductor processing chamber and method of fabricating same
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United States of America Patent
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Oct 14, 2003
Grant Date -
Aug 7, 2003
app pub date -
Feb 7, 2002
filing date -
Feb 7, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An article having a protective coating for use in semiconductor applications and method for making the same is provided. In one embodiment, a method of coating an aluminum surface of an article utilized in a semiconductor deposition chamber includes the steps of heating a coating material to a semi-liquidous state, the coating material comprising at least one material from the group consisting of aluminum fluoride and magnesium fluoride and depositing the heated coating material on the aluminum surface. The protective coating has a beta phase grain orientation of less than about 10 percent that has good adhesion to aluminum and resists cracking, flaking and peeling. Some articles that may be advantageously coated include showerheads, blocker plates, support assemblies and vacuum chamber bodies, among others.
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