US Patent No: 6,633,174
Number of patents in Portfolio can not be more than 2000
Stepper type test structures and methods for inspection of semiconductor integrated circuits
Stats
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Oct 14, 2003
Issued date -
Aug 25, 2000
filing date -
09/648,093
serial no -
In Force
status
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Abstract
Disclosed is a method of inspecting a sample. The method includes moving to a first field associated with a first group of test structures. The first group of test structures are partially within the first field. The method further includes scanning the first field to determine whether there are any defects present within the first group of test structures. When it is determined that there are defects within the first group of test structures, the method further includes repeatedly stepping to areas and scanning such areas so as to determine a specific defect location within the first group of test structures. A suitable test structure for performing this method is also disclosed.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
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| 4,644,172 Electronic control of an automatic wafer inspection system | 130 | 1984 | |
| 5,537,669 Inspection method and apparatus for the inspection of either random or repeating patterns | 120 | 1993 | |
| 5,502,306 Electron beam inspection system and method | 228 | 1994 | |
| 5,578,821 Electron beam inspection system and method | 207 | 1995 | |
| 6,021,214 Inspection method and apparatus for the inspection of either random or repeating patterns | 45 | 1995 | |
| 5,665,968 Inspecting optical masks with electron beam microscopy | 55 | 1996 | |
| 5,717,204 Inspecting optical masks with electron beam microscopy | 83 | 1996 | |
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| 6,091,249 Method and apparatus for detecting defects in wafers | 79 | 1998 | |
| 6,252,412 Method of detecting defects in patterned substrates | 133 | 1999 | |
| 6,344,750 Voltage contrast method for semiconductor inspection using low voltage particle beam | 80 | 1999 | |
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| 4,814,615 Method and apparatus for detecting defect in circuit pattern of a mask for X-ray exposure | 13 | 1987 | |
| 5,051,585 Apparatus and method of pattern detection based on a scanning transmission electron microscope | 40 | 1989 | |
| 6,476,390 Method and apparatus for inspecting integrated circuit pattern using a plurality of charged particle beams | 24 | 2000 | |
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| 5,804,459 Method for charge enhanced defect breakdown to improve yield and reliability | 19 | 1996 | |
| 5,959,459 Defect monitor and method for automated contactless inline wafer inspection | 48 | 1996 | |
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| 6,292,582 Method and system for identifying defects in a semiconductor | 94 | 1997 | |
| 6,324,298 Automated wafer defect inspection system and a process of performing such inspection | 118 | 1999 | |
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| 5,557,105 Pattern inspection apparatus and electron beam apparatus | 60 | 1994 | |
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| 6,061,814 Test circuitry for determining the defect density of a semiconductor process as a function of individual metal layers | 32 | 1998 | |
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| 6,265,232 Yield based, in-line defect sampling method | 65 | 1998 | |
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| 5,489,852 System for interfacing wafer sort prober apparatus and packaged IC handler apparatus to a common test computer | 42 | 1992 | |
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| 4,902,967 Scanning electron microscopy by photovoltage contrast imaging | 35 | 1989 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Apr 14, 2015 |
| Fee | Large entity fee | small entity fee | micro entity fee |
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| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
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