Methods for cleaning microelectronic structures with aqueous carbon dioxide systems
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United States of America Patent
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-
Nov 4, 2003
Grant Date -
Aug 22, 2002
app pub date -
Sep 13, 2001
filing date -
Feb 15, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of cleaning and removing water and entrained solutes during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing a partially fabricated integrated circuit, MEM's device, or optoelectronic device having water and entrained solutes on the substrate; (b) providing a densified (e.g., liquid or supercritical) carbon dioxide drying composition, the cleaning composition comprising carbon dioxide, water, and, optionally but preferably, a cleaning adjunct; (c) immersing the surface portion in the densified carbon dioxide cleaning composition; and then (d) removing the cleaning composition from the surface portion.
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