Contamination control on lithography components
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United States of America Patent
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Nov 4, 2003
Grant Date -
N/A
app pub date -
Dec 23, 2002
filing date -
Dec 23, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Contamination control apparatus and methods for the removal of particulate contamination on EUV mirrors and reflective masks are provided. Embodiments in accordance with the present invention involve providing a charge to the particles and moving them away from the reflective surface by electrostatic elements. An electron source and one or more electrostatic elements are positioned adjacent the reflective surface of the reflective component. The electron source is adapted to shower electrons onto the particles in an area above the reflective surface and on the reflective surface to provide a negative charge to the particles. The electrostatic elements are adapted to provide an attractive electrostatic charge to attract the negatively charged particles on and near the reflective surface.
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