Integrated process tool monitoring system for semiconductor fabrication
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United States of America Patent
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Nov 18, 2003
Grant Date -
N/A
app pub date -
Oct 30, 2002
filing date -
Oct 30, 2002
priority date (Note) -
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Abstract
An integrated process tool monitoring system for semiconductor fabrication. Specifically, a process tool parameter auditing system, where a process tool user need not run a different verification system for each process tool type used and need not download parameters every time before a semiconductor device or material is to be processed by the process tool.
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