Process for the production of a wiping material for a vacuum chamber
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United States of America Patent
Stats
-
Nov 25, 2003
Grant Date -
Feb 7, 2002
app pub date -
Jun 26, 2001
filing date -
Jun 30, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention provides a wiping material for a vacuum chamber having sufficient sludge wiping properties and water retention attained by easy control over cell diameter and use of a polyurethane foam which has been foamed free from a silicone-based surface active agent and a process for the production thereof. A wiping material made of a polyurethane foam for a vacuum chamber for use in the preparation of a silicon wafer is described, wherein the polyurethane foam is free of silicone and has an open-cell structure comprising cells the diameter of which are controlled to fall within the range of from 500 .mu.m to 3,000 .mu.m.
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