Processing apparatus, processing system, distinguishing method, and detecting method

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United States of America Patent

PATENT NO 6654668
SERIAL NO

09502580

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The temperature of a hot plate is not more than a predetermined threshold when a wafer is accurately mounted at a substrate mounting position on the hot plate, whereas the temperature of the hot plate is the predetermined threshold when the wafer is not accurately mounted at the substrate mounting position on the hot plate. Therefore, when the temperature of the hot plate is not less than the predetermined threshold when the wafer is mounted on the hot plate, it is judged that the wafer is stranded on a guide, and an alarm is given by means of a speaker or a display section.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harada, Koji Kikuyo-Machi, JP 103 847
Nakayama, Hisakazu Kumamoto, JP 5 49
Ookura, Jun Kumamoto, JP 17 295

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