Tunable ramp rate circuit for a mass flow controller
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United States of America Patent
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-
Dec 2, 2003
Grant Date -
Dec 19, 2002
app pub date -
Jun 13, 2001
filing date -
Jun 13, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for stabilizing startup gas flow through an MFC supplying reactant gases to a semiconductor system, wherein the method includes receiving a gas setpoint in a tunable activation circuit, determining a desired valve control voltage corresponding to the gas setpoint, and bypassing an MFC valve controller signal. The method further includes ramping a valve control voltage for a flow control valve of the MFC to the desired valve control voltage with the tunable activation circuit, and returning control of the MFC to an MFC valve controller circuit.
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