Method and apparatus for creating an open cell micro-environment for treating a substrate with an impingement spray

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6656017
APP PUB NO 20020155792A1
SERIAL NO

10132095

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention is a method and apparatus for providing a low-cost and less complex micro-environment for treating a substrate using an impingement cryogenic or steam spray jet. A substrate and fixture is contained within an open-architecture prophylactic or cleaning cell whereupon the substrate and fixture is continuously bathed in a regenerated and re-circulating stream of filtered, inert, dry, heated and ionized atmosphere which bathes both the entire substrate and fixture. This prevents the intrusion of contaminating ambient atmospheres onto critical surfaces. The cleaning cavity is constantly regenerated and re-circulated through the cleaning cell to maintain a majority of the clean atmosphere wherein the clean cavity is pressurized slightly with a small volume of clean dry air or inert gas to prevent the intrusion of ambient atmosphere into the cleaning cell. A small exhaust duct removes the partial pressure of atmosphere from the open regions of the cleaning cavity, capturing the escaping cavity atmosphere. The exemplary spray cleaning applicator of the present invention provides a majority of the make-up atmosphere required to operate the cleaning cell. The treated surface is thus isolated and protected from the ambient atmosphere and contaminants contained therein prior to, during and following application of a treatment spray. The present invention allows for the simultaneous application of a variety of conventional surface treatment agents such as dry steam or snow to a critical surface. Finally, the present invention controls and maintains the quality of the environment immediately within the vicinity of the substrate being treated, and the ambient atmosphere.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH CORPORATION17-1 TORANOMON 1-CHOME MINATO-KU TOKYO 1056409 ?1056409

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jackson, David P 22328 W. Barcotta Dr., Saugus, CA 91350 51 1513

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation