Substrate processing apparatus and substrate processing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Dec 2, 2003
Grant Date -
N/A
app pub date -
Jun 8, 2000
filing date -
Jun 9, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A blast unit for sending air from the top of a processing chamber to the bottom thereof and an exhaust pipe for exhausting gas from the bottom of the processing chamber are provided. Concomitantly with a change in pressure in the processing chamber, intervals of a slit damper and/or the degree of opening of a damper is controlled by a controller and thus a blast amount or an exhaust amount is controlled, thereby maintaining the pressure in the processing chamber almost constant.
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