Manufacturing method of photomask and photomask
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United States of America Patent
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-
Dec 2, 2003
Grant Date -
Jan 17, 2002
app pub date -
Jun 18, 2001
filing date -
Jul 7, 2000
priority date (Note) -
In Force
status (Latency Note)
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Abstract
In order to shorten the time required to change or correct a mask pattern over a mask, light-shielding patterns formed of a resist film for integrated circuit pattern transfer are partly provided over a mask substrate constituting a photomask in addition to light-shielding patterns formed of a metal for the integrated circuit pattern transfer.
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