Simulation-based feed forward process control
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United States of America Patent
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Dec 2, 2003
Grant Date -
Jun 26, 2003
app pub date -
Dec 26, 2001
filing date -
Dec 26, 2001
priority date (Note) -
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status (Latency Note)
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Abstract
A method of optimizing a wafer fabrication process for a given mask is provided. The method includes capturing an image of a mask and simulating a wafer image of the mask. A mask map of information can then be generated based on the simulated wafer image. The resulting mask map can be provided to any downstream wafer fabrication process when such process involves the mask. One or more one input parameters to the downstream wafer fabrication process can be changed based on the mask map, thereby optimizing the process for the given mask.
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