Cleaning gas and method for cleaning vacuum treatment apparatus by flowing the cleaning gas
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United States of America Patent
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Dec 9, 2003
Grant Date -
N/A
app pub date -
Jan 11, 2000
filing date -
Jan 12, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A cleaning gas includes HF gas whose concentration is greater than or equal to 1 vol % and oxygen containing gas whose concentration ranges from 0.5 to 99 vol %. The oxygen containing gas includes at least one of O.sub.2 gas, O.sub.3 gas, N.sub.2 O gas, NO gas, CO gas and CO.sub.2 gas. The cleaning gas is employed to remove a deposited material generated in a vacuum treatment apparatus for producing a thin film of at least one of Ti, W, Ta, Ru, Ir, a compound thereof and an alloy thereof.
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