Dispersion liquid of silica particles for polishing, method of producing the same, and polishing agent
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United States of America Patent
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Dec 30, 2003
Grant Date -
Apr 10, 2003
app pub date -
Sep 26, 2002
filing date -
Oct 1, 2001
priority date (Note) -
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Abstract
The present invention provides a dispersion liquid of silica particles for polishing with a low content of Na ions and also with a content of ions other than Na ions in a prespecified range. This dispersion liquid is a dispersion liquid of silica particles in which the silica particles having the average particle diameter in the range from 5 to 300 nm is dispersed, and a content of Na ions in the silica particle is less than 100 ppm, while a contents of ions other than Na ions is in the range from 300 ppm to 2 weight %.
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