System and method for automated monitoring and assessment of fabrication facility
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United States of America Patent
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-
Dec 30, 2003
Grant Date -
Aug 22, 2002
app pub date -
Oct 16, 2001
filing date -
Oct 17, 2000
priority date (Note) -
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Abstract
A method for monitoring and assessing operation of a semiconductor fabrication facility comprises the steps of connecting a monitoring and assessment system to a system bus which is connected directly or indirectly to a manufacturing execution system and a plurality of semiconductor fabrication tools. Through a user interface, the state models can be configured for the semiconductor fabrication tools where each state model is based upon a set of defined triggers for each tool. During monitoring various messages are transmitted on the system bus between the semiconductor fabrication tools and the manufacturing execution system and the monitoring and assessment system, and appropriate triggers are generated based upon the messages where the triggers are selected from a set of defined triggers. During operation, the state models are updated for each tool affected by one of the triggers and transitions within the state models are recorded in a tracking database.
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