Importance

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Abstract

The present invention provides a pattern inspection apparatus whereby, even if a large number of defects are detected during inspection it is possible to continue inspection without interruption of the inspecting operation and the apparatus comprising optical means 4 and 5 for generating pattern image data from a pattern under test 9 held by the moving holding means 3, an image comparison sections 71 that compare the pattern under inspection with reference pattern image information so as to make a judgment as to whether or not a defect exists in the partial patterns under inspection, the image comparison sections 71 having a comparison pattern image information storage means 712, which stores comparison pattern image data for a partial pattern under inspection, reference pattern image information storage means 711 and/or 713 which store reference pattern image data corresponding to the partial patterns under inspection and an image processing means 715 that perform a comparison between the comparison pattern image data and the reference pattern image data so as to make a judgment as to whether or not there is a defect in the pattern under inspection. This apparatus 100 further having a defect information accumulation means 83 which sequentially stores defect information of a prescribed partial pattern under inspection in the respective inspection regions output by the image processing means 715 in the image comparison sections 71 and a reviewing means 8, which outputs defect information at a prescribed time.

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First Claim