Process chamber having a corrosion-resistant wall and method
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United States of America Patent
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Jan 27, 2004
Grant Date -
Mar 27, 2003
app pub date -
Sep 24, 2001
filing date -
Sep 24, 2001
priority date (Note) -
Expired
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Abstract
A substrate processing chamber has a substrate support, a gas supply, a gas exhaust, a gas energizer, and a wall about the substrate support, the wall having a porous ceramic material at least partially infiltrated with a fluorinated polymer, whereby a substrate on the substrate support may be processed by gas introduced by the gas supply, energized by the gas energizer, and exhausted by the gas exhaust.
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