Importance

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Abstract

A photoresist etching process and system can be used for the etching of non-planar or three-dimensional surfaces by using a non-planar shaped fiber optic array or fiber optic panel. The array or panel has a contour or shape that may nest a non-planar or three-dimensional article or surface. The non-planar or three-dimensional article or surface has a photoresist composition on its surface facing the optical fibers of the fiber optic array or panel, and the article or surface is nested against the contour or shape of the array or panel. Radiation is transported through the optical fibers and exposes the photoresist composition. The optical fiber array may perform an image-wise exposure of the photoresist composition by appropriate blockage of the radiation before it enters or as it enters a distal end of the optical fibers. In this manner, an image-wise distribution of radiation is presented against the photoresist composition, and an image-wise developable resist pattern is created on the non-planar or three-dimensional article or surface. This process can be used on cylinders, tubes, spheres, undulating surfaces, blocks, wavy surfaces, stepped surfaces, and any other shape that can be standardized or formatted into a nesting shape.

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First Claim