Method and apparatus for three-dimensional modeling
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United States of America Patent
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-
Feb 3, 2004
Grant Date -
Nov 8, 2001
app pub date -
Jul 9, 2001
filing date -
Jun 23, 1999
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Disclosed are an apparatus and method for three-dimensional deposition modeling, which shield a supply of modeling filament fed through a deposition modeling machine from exposure to environmental moisture. Dry gas under pressure is supplied to a filament path leading from a material supply to a liquifier, creating an active moisture barrier along the filament path. In a preferred embodiment, an entrance of the filament path is configured to seal to an exit orifice of a cassette containing the material supply, and an exit of the filament path is vented to release exhaust gas.
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