Importance

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Abstract

Disclosed are methods and apparatus for generating reference images to reduce the number of false defects found when comparing a reference image to a corresponding target image of a reticle or mask (or integrated circuit). In one specific implementation, parameters that characterize the reticle making process are collected from a representative reticle or reticle. These parameters are collected (e.g., measured) from a reticle prior to inspection of the reticle. The collected parameters are then used to simulate process effects on the reference images of the design data. After the layout data is altered to simulate process effects and represent a 'real' layout after it has been fabricated into a mask, this 'real' layout data is then altered again to simulate imaging effects. The resulting reference images now include both processing and imaging effects and may then be used during an inspection of a corresponding reticle or integrated circuit.

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First Claim