Gas dispersion apparatus for use in a hot filament chemical vapor deposition chamber
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United States of America Patent
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Feb 17, 2004
Grant Date -
N/A
app pub date -
Feb 23, 2000
filing date -
Aug 30, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A carbon deposition chamber is provided with several advantages. The gas mixture used within the deposition process is expressed from tubing through three zones, which are each individually determined with needle valves. The substrate is permitted to rotate back-and-forth to permit more even deposition of carbon films onto the substrate. The heating filaments are permitted to expand and contract without breakage by permitting the electrode attached to one end of the filaments to move freely as the filaments change in length. The substrate and the heating filaments are cooled to a temperature to prevent carbonization by permitting a cooling fluid to be passed through tubing connected to these elements in a heat sink like manner.
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