Method and system for processing substrate
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United States of America Patent
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Mar 9, 2004
Grant Date -
Oct 31, 2002
app pub date -
Apr 26, 2002
filing date -
Apr 27, 2001
priority date (Note) -
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Abstract
A method and system for processing a substrate includes performing a wet process by supplying a working liquid to a substrate in a wet processing apparatus, transferring the substrate in a non-dry state from the wet processing apparatus to a drying apparatus, and subjecting the substrate to a supercritical drying by a supercritical fluid in the drying apparatus.
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