Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane
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United States of America Patent
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Mar 9, 2004
Grant Date -
Aug 1, 2002
app pub date -
Feb 14, 2002
filing date -
Nov 15, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A projection exposure apparatus and method forms a first intensity distribution on a predetermined plane substantially conjugate with a pupil plane of a projection optical system. A shaping optical system is located between a light source and an optical integrator of an illumination optical system. The shaping optical system includes a diffraction optical member to generate diffracted light in a direction different from an optical axis of the illumination optical system. In addition, a movable optical element is provided to adjust the first intensity distribution. The first intensity distribution has an increased intensity portion apart from the optical axis relative to a portion of the first intensity distribution on the optical axis.
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