Developing treatment method and developing treatment unit

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6706321
APP PUB NO 20010050050A1
SERIAL NO

09867688

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Abstract

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The present invention relates to a method of supplying a developing solution to a surface of a substrate to perform developing treatment for the substrate, comprising a first step of supplying the developing solution to the surface of the substrate while a developing solution supply nozzle is moving relative to the substrate and a second step of developing the substrate for a first predetermined period of time, and the second step has the step of stirring the developing solution on the surface of the substrate after a second predetermined period of time from the completion of the first step. Because of stirring, the concentration of the developing solution on the substrate is made uniform, resulting in a rise in the uniformity of developing treatment.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO 107-6325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishiya, Akira Kumamoto, JP 11 161
Sakamoto, Kazuo Kumamoto, JP 78 763

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