Exposure apparatus having independent chambers and methods of making the same
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United States of America Patent
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Mar 16, 2004
Issued Date -
N/A
app pub date -
Jul 6, 1999
filing date -
Mar 2, 1994
priority date (Note) -
Expired
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Abstract
An exposure apparatus is made so as to have respective chambers in which a main exposure system, a substrate carrying system, and a mask carrying system are housed. The apparatus is structured so that the respective environments in the chambers are substantially independently maintained from each other. Substrate processing can be facilitated by incorporating photoelectric detection of the substrate center in association with handing-over of the substrate from one substrate carrying member to another, and/or storage of a cleaning substrate in a storage member which also holds substrates being processed by the apparatus.
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